The big joke about extreme ultraviolet (EUV) technology is that it takes seven trucks to deliver the mammoth tools compared to one for other advanced lithography tools — but actually, this is no joke.

If a lot of the buzz at SPIE last week came from the packed sessions on EUV technology, a lot of the serious note-taking was done at the papers on double-patterning. Not least among the sources of ...

TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...

In the famous double-slit experiment, an interference pattern consisting of dark and bright bands emerges when a beam of light hits two narrow slits. The same effect has also been seen with particles ...

Experts at the Table: Semiconductor Engineering sat down to discuss extreme ultraviolet (EUV) lithography and other next-generation fab technologies with Jerry Chen, head of global business ...

Several fab tool vendors are rolling out the next wave of self-aligned patterning technologies amid the shift toward new devices at 10/7nm and beyond. Applied Materials, Lam Research and TEL are ...